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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F5-06
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filingDate 2003-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c1531089443c6242cddcf8f9f8b7ee4
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publicationDate 2005-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2005132765-A
titleOfInvention Novel compound, Al-based film forming material, Al-based film forming method, Al-based film and semiconductor element
abstract PROBLEM TO BE SOLVED: To provide an Al-based film having good in-plane uniformity and excellent step coatability. An Al-based film forming material of a compound represented by the following general formula [I]. Formula [I] H 3 Al: L k [In the general formula [I], k is 1 or 2, and L is a cyclic amine represented by the following general formula [II]. ] Formula [II] [However, in General Formula [II], R 7 is H or a hydrocarbon group, and R 1 to R 6 are H or a hydrocarbon group. R 1 to R 7 may be the same as or different from each other. ]
priorityDate 2003-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 29.