http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005123599-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2004-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8ecab0f10a4e527450b6638b5ea685f3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c2a9aacf507db12b95a8f92ddad3e63f |
| publicationDate | 2005-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005123599-A |
| titleOfInvention | Method for evaluating semiconductor coating solution |
| abstract | PROBLEM TO BE SOLVED: To provide a method for more easily evaluating a coating film solution, which can grasp the quality of a coating film obtained without actually forming the coating film and thereby can evaluate the coating film solution To do. The degree of clogging when a solution for a semiconductor coating film is filtered through a filter having an average pore diameter of 0.01 to 0.4 μm is measured, and the quality of the semiconductor coating film formed by the solution is estimated from the measured value. The evaluation method of the solution for semiconductor coating films containing doing. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009113148-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006126818-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4577172-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015011292-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014118466-A |
| priorityDate | 2003-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 61.