http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005118694-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08
filingDate 2003-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3483248b7ae28f333b0b2cfdffb58aa6
publicationDate 2005-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2005118694-A
titleOfInvention Method and apparatus for decomposing organohalogen compounds using plasma
abstract 【Task】 In the decomposition process of the organic halogen compound by plasma, the corrosive gas comes into contact with the anode nozzle, so that it corrodes in a short time, and the chlorofluorocarbon cannot be decomposed stably for a long time. As a result, a satisfactory decomposition treatment has not been performed, such as an increase in the decomposition treatment cost of Freon gas. [Solution] Corrosive gas generated in the decomposition treatment space during the decomposition treatment of Freon is prevented from flowing back to the anode nozzle side and contacting the anode nozzle by controlling the narrowing of the plasma arc. Stable decomposition of CFCs can be performed. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100904663-B1
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007522935-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101930486-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101373196-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019188397-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014511756-A
priorityDate 2003-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 24.