http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005112814-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_696ca0ae93d5cf5a686273601361781f |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-96 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2003-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f853984c85e67773ba6e4556eadbb0f8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c35d46618ed9f8e9ead456a9d0cd4699 |
| publicationDate | 2005-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005112814-A |
| titleOfInvention | Resist compound and radiation-sensitive composition |
| abstract | Provided are a resist compound that can be used not only for ultraviolet rays such as i-line and g-line, but also for excimer laser light such as KrF, electron beam, and X-ray, and a radiation-sensitive composition containing the same. . A radiation-sensitive composition comprising a compound represented by the following formula and the compound and an acid generator. (Wherein R 1 is an acid-dissociable functional group independently selected from a hydrogen atom, a substituted methyl group, a tert-butoxycarbonyl group, etc., and at least one is a characteristic group other than a hydrogen atom. M is 0. An integer of .about.3, at least one of which is 1 or more.) [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016071243-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012150175-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018147812-A |
| priorityDate | 2003-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 94.