http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005109353-A

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filingDate 2003-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9725e585716109a2c1650d5ce90f21de
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publicationDate 2005-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2005109353-A
titleOfInvention Manufacturing method of light emitting diode
abstract A method of manufacturing a light emitting diode capable of increasing manufacturing efficiency is provided. An epi-wafer 101 and a p-GaP substrate 7 are introduced into a heat treatment furnace 120 in contact with each other, and then a heat treatment mechanism 122 is operated while supplying phosphine and arsine into the heat treatment furnace 120. Then, heat treatment is performed at a high temperature of about 800 ° C. for about 1 hour. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008004587-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007059873-A
priorityDate 2003-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 22.