| abstract |
Uniform film thickness by suppressing the occurrence of smearing when a photoresist composition is applied on a highly reflective metal film, and by suppressing the formation of dripping marks in a coating method in which spin is performed after the central dropping. In the discharge nozzle type coating method, it is possible to solve at least one problem of suppressing the generation of streak-like marks and improving the uniformity of the film thickness, and preferably all the problems are solved. Provided is a positive photoresist composition that can be solved. SOLUTION: (A) an alkali-soluble novolak resin, (C) a naphthoquinonediazide group-containing compound, (D) an organic solvent, and (E) a polyester-modified polydialkylsiloxane surfactant containing a specific repeating unit. A positive photoresist composition comprising: a positive photoresist composition; [Selection figure] None |