http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005106837-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2003-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_220c533404f3cff401b4b251dd876e92 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf54b237c74b4fcdad8ed35bf0918d74 |
| publicationDate | 2005-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005106837-A |
| titleOfInvention | Photoresist system |
| abstract | For example, optical imaging can be performed using short-wavelength radiation including exposure radiation of 248 nm or 193 nm, or radiation having a wavelength of about 157 nm by an F 2 excimer laser, and silicon oxynitride (SiON) ) And other photoresist systems having excellent adhesion to a substrate having an inorganic surface layer, and a finer pattern forming method using the photoresist system. Applying a coating layer of the processing composition on the inorganic surface layer; applying a photoresist coating layer composition on the coating layer of the processing composition; patterning the applied photoresist layer A method of forming a photoresist relief image, and a step of developing the exposed photoresist layer to obtain a relief image of the photoresist, and a photoresist system used in the method . [Selection figure] None |
| priorityDate | 2003-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 104.