http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005101479-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2003-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0753218c46835e9b576fdafda491dba6 |
| publicationDate | 2005-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005101479-A |
| titleOfInvention | Cleaning solution for semiconductor substrates |
| abstract | 【Task】 In order to miniaturize and increase the speed of semiconductor devices, a technique for cleaning the surface of a semiconductor substrate at the time of device manufacture has become increasingly important. In addition to silicon, silicon oxide films, silicon nitride films, and the like are used as materials constituting the elements of semiconductor devices formed on the wafer, and in recent years, metal films such as cobalt and tungsten have been newly introduced. is there. Development of a cleaning solution that can efficiently remove impurities and the like attached to the wafer surface without damaging the materials constituting the elements of semiconductor devices that have been used in recent years is desired. . [Solution] An excellent semiconductor that can be used at room temperature while maintaining excellent metal ion and metal impurity removal performance on the surface of a semiconductor substrate, and that does not cause etching of metal films such as silicon oxide and tungsten A substrate cleaning solution is provided. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112639068-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8709278-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8540894-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013119579-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190127185-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009514238-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5505987-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114367200-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5491184-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102324275-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2013162020-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010005103-A1 |
| priorityDate | 2002-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 174.