| abstract |
PROBLEM TO BE SOLVED: To provide a resist material excellent in transparency to exposure light having a wavelength of 300 nm or less and excellent in substrate adhesion and development solubility. A base resin of a resist material is composed of units represented by a general formula of [Chemical Formula 3]. [Chemical 3] R 1 , R 2, and R 3 are the same or different and are a hydrogen atom, a fluorine atom, a linear alkyl group having 1 to 20 carbon atoms, a branched or cyclic alkyl group, or fluorine. R 4 is a linear alkylene group having 0 or more and 20 or less carbon atoms or a branched or cyclic alkylene group, and R 5 and R 6 are the same or different. And a protecting group which is eliminated by an acid, a straight-chain alkyl group having 1 to 20 carbon atoms, a branched or cyclic alkyl group, a fluorinated alkyl group, or an acid. [Selection figure] None |