http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005089841-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b55c349b43c3ecba4977fd52cc8f8c67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D21-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-288 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18 |
| filingDate | 2003-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47c976734aa6514ae56d10e0c78ab73b |
| publicationDate | 2005-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005089841-A |
| titleOfInvention | Method for detecting state of electroplating bath and electroplating apparatus |
| abstract | PROBLEM TO BE SOLVED: To detect a composition variation of a plating bath in real time during precise electroplating, and to keep a good electroplated film by quickly responding to the composition variation such as supply of an additive. To be obtained. In electroplating an electronic device and an electronic device mounting substrate, a potential with respect to a reference electrode of a substrate cathode to be plated is detected in a predetermined period during the plating, and the variation of the potential is represented by a feature vector. This is compared with a predetermined characteristic pattern of potential fluctuation, and it is displayed which pattern is closest, and an alarm is issued when a pattern that is classified as abnormal is approached. [Selection] Figure 1 |
| priorityDate | 2003-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.