| abstract |
PROBLEM TO BE SOLVED: To provide a sulfonyldiazomethane compound and a photoacid generator suitable for a chemically amplified resist material, and a resist material and a pattern forming method using the same. A sulfonyldiazomethane compound represented by the following general formula (1) and a photoacid generator comprising the compound. Further, (A) a chemical amplification comprising a resin whose solubility in an alkali developer is changed by the action of an acid, and (B) a sulfonyldiazomethane compound represented by the above general formula (1) that generates an acid upon irradiation with radiation. Type resist material. Further, the method includes a step of applying the resist material on the substrate, a step of performing a heat treatment, a step of exposing, and a step of developing using a developer after heat treatment as necessary. Pattern forming method. For example, [Selection figure] None |