http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005063985-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_02cfb0f1aa2718c61bdf184d53adfe79
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-64
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filingDate 2003-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ba85597af8bb7bc899acc0b5381413b
publicationDate 2005-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2005063985-A
titleOfInvention Conveying apparatus and conveying method, exposure apparatus and exposing method, and device manufacturing method
abstract A gas replacement apparatus, an exposure apparatus, and a device manufacturing method that can efficiently and stably replace a gas in a mask space in a short time. One end portion is provided around a pattern formation region on a mask substrate and at least two ventilation portions are formed, and the other end portion of the frame member is provided to protect the pattern formation region. And a mask holding member (111) for holding the mask (R), a mask (R), and a mask holding member (111). And the gas supply port (112) facing at least one of the two ventilation portions when the mask (R) is held on the mask holding member (111). [Selection] Figure 5
priorityDate 2003-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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