http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005062343-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44b2ac87aeadb161b83426d9cf6c4bdc |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B7-007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B7-263 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B7-261 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B7-007 |
filingDate | 2003-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b9bd4f0b843245a584872596e9e537b |
publicationDate | 2005-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2005062343-A |
titleOfInvention | Pit pattern forming method, stamper, and recording medium manufacturing method |
abstract | PROBLEM TO BE SOLVED: To form a pit in a pit pattern in a desired size using an exposure beam with a short wavelength. A resin layer 22 containing a benzophenone-based compound is formed on the surface of a substrate 21, a photoresist layer 23 is formed on the surface of the resin layer 22, and an exposure laser beam having a wavelength λ of 100 nm to 300 nm is applied. By irradiating the photoresist layer intermittently to form a latent image of a pit pattern in which the half-value width l of the shortest pit length is l ≦ 0.65λ, and developing the photoresist layer on which the latent image is formed A pit pattern is formed on the photoresist layer. [Selection] Figure 4 |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100601699-B1 |
priorityDate | 2003-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 30.