http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005053937-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2f8cfa5aee4410611b5c562275c9f8e3 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F16-22 |
| filingDate | 2003-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9f8061575e5390c353b43cdd92a0537 |
| publicationDate | 2005-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005053937-A |
| titleOfInvention | Method for producing polymer compound for photoresist |
| abstract | An object of the present invention is to provide a method for producing a base polymer compound of a resist material having high transparency and good resist performance for microfabrication required in semiconductor production. In a polymerization method including at least a vinyl ether monomer or an acrylic monomer containing a fluorine atom in a molecule, a compound that does not contain a double bond in the molecule is used as a polymerization solvent. The amount of the solvent used is 0.01 to 3.0 times the total weight of the monomers used for the polymerization, and it is polymerized in the presence of a polymerization initiator. A method for producing a molecular compound is provided. [Selection figure] None |
| priorityDate | 2003-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 182.