http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005042123-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D7-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-25 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-02 |
filingDate | 2004-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bba022755b00dd3565ebe341cafffca0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d6557f8f38fef5e970aff414b5b73cd4 |
publicationDate | 2005-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2005042123-A |
titleOfInvention | Composition for forming silica-based film, silica-based film and method for forming the same, and electronic component provided with silica-based film |
abstract | PROBLEM TO BE SOLVED: To provide a composition for forming a silica-based film which is excellent in low dielectric property and has sufficient mechanical strength and can form a silica-based film that can be cured at a lower temperature and in a shorter time than conventional. A component (a): a siloxane resin obtained by hydrolytic condensation of a compound represented by the general formula (1); a component (b): an organic solvent containing at least one aprotic solvent; A composition for forming a silica-based film, wherein the aprotic solvent contains a dialkyl ether of a dihydric alcohol. [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101751714-B1 |
priorityDate | 2004-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 526.