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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-737
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filingDate 2003-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da474ce13ec9e4559545377391ff0f44
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publicationDate 2005-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2005032897-A
titleOfInvention Heterojunction bipolar transistor
abstract An object of the present invention is to provide an HBT structure capable of increasing the breakdown voltage of a collector layer without changing the film thickness and carrier concentration of the collector layer. A GaAs subcollector layer, a GaAs collector layer, a GaAs base layer, an emitter layer made of AlGaAs or InGaP are sequentially stacked on a semi-insulating substrate, and a collector electrode is formed on the subcollector layer. 13 is a heterojunction bipolar transistor in which a base electrode 12 is formed on the base layer and an emitter electrode 11 is formed on the emitter layer. All or part of the collector layer 6 is made of AlAs having a wider band gap than GaAs. The collector layer 10 is made of a material such as AlGaAs or AlPSb to increase the breakdown voltage of the collector layer. [Selection] Figure 1
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priorityDate 2003-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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