Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32139 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-32 |
filingDate |
2003-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf25699f936c429d2960c96b3d580863 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa2cb7c359542910a76240bf37ce8323 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_603a42fa47ac7c68bf5e92c5e7216d7f |
publicationDate |
2005-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2005032751-A |
titleOfInvention |
Manufacturing method of electronic device |
abstract |
The present invention provides a resist composition and a developing method capable of forming a fine pattern without pattern collapse. A resist composition having a polymer whose main component is a solubility parameter value of a supercritical carbon dioxide or less is applied on a substrate, and a desired pattern exposure treatment is performed. A pattern formation method in which development is performed using supercritical carbon dioxide at atmospheric pressure or lower. [Selection] Figure 1 |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007101673-A |
priorityDate |
2003-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |