| abstract |
An aqueous dispersion for chemical mechanical polishing that does not rot even when used in a neutral region, and hardly causes surface defects such as scratches and dishing, and can sufficiently flatten the polished surface. To provide. The chemical mechanical polishing aqueous dispersion of the present invention comprises (A) abrasive grains, (B) 2-bromo-2-nitro-1,3-propanediol, 2-bromo-2-nitro-1, At least one compound selected from the group consisting of 3-butanediol, 2,2-dibromo-2-nitroethanol and 2,2-dibromo-3-nitrilopropionamide, and (C) other than the component (B) Contains organic components. [Selection figure] None |