http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005025150-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2003-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_201abdae12f920f7b848ecd29a09137f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d03ae680b24404410ab5dd85518cc5b |
| publicationDate | 2005-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005025150-A |
| titleOfInvention | Positive resist composition and pattern forming method using the same |
| abstract | PROBLEM TO BE SOLVED: To provide a resist composition suitable for use with an exposure light source of 250 nm or less, particularly F 2 excimer laser light, and has a high dissolution, a high dissolution contrast, and excellent in sensitivity and resolving power A resist composition and a pattern forming method using the same are provided. (A) a resin soluble in an alkali developer or a resin that is hardly soluble in an alkali developer but becomes soluble in an alkali developer by the action of an acid; and (B) an acid upon irradiation with actinic rays or radiation. And (C) two or more sulfonic acid ester groups that are stable to actinic rays and heat and decompose by the action of an acid to generate sulfonic acid, and the sulfonic acid ester group A positive resist composition containing a dissolution inhibiting compound connected to each other by a mother nucleus having an aromatic ring or a polycyclic cycloalkyl skeleton, and a pattern forming method using the same. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I475324-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011077941-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011209719-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011033729-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5692092-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012258399-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101810520-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9223208-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103293856-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9120726-B2 |
| priorityDate | 2003-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 334.