http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005017581-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_67f2bb9a79bd8433343ae221f81551cf
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-498
filingDate 2003-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_16a39135dff876ec7d9bddaf4719bf5b
publicationDate 2005-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2005017581-A
titleOfInvention Photothermographic material
abstract The present invention provides a photothermographic material which has high sensitivity, has low dependency on the humidity of character line width during development, and does not generate much black spots even when processed in a high humidity environment. On a support, (1) a photosensitive emulsion layer containing a nucleating agent and not containing a photosensitive dye, and (2) a photosensitive emulsion layer containing a photosensitive dye and containing no nucleating agent. A photothermographic material characterized by the above. [Selection figure] None
priorityDate 2003-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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