http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005015651-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ee1c19da359446fb5c4f0458a57b783d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F236-20 |
| filingDate | 2003-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c3e7c8b26bbc3bc40dea722c036ddd5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6602369c5727b11b03570b310bf13f1 |
| publicationDate | 2005-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005015651-A |
| titleOfInvention | Fluoropolymer and resist composition |
| abstract | A resist composition for photolithography using ultraviolet rays of 250 nm or less and a polymer for the composition are provided. A fluorine-containing polymer (A) having a monomer unit obtained by cyclopolymerizing a fluorine-containing diene represented by formula (1) and a monomer unit obtained by polymerizing an acrylic monomer having a fluorine atom, and A resist composition containing the fluorine-containing polymer. CF 2 = CFCF 2 -C (CF 3) OR 1 -CH 2 CH = CH 2 ยทยทยท (1) (However, R 1 represents a blocking group that can be converted to a hydrogen atom or a group having an acidic group by a hydrogen atom or an acid.) [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023157591-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8497623-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006348088-A |
| priorityDate | 2003-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 119.