http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005010213-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2003-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b800b46f1ca77d85db8efe078b92b37b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93c73d832f83b05a2bba1832f671c118 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1b9fca2eff37b7301541171e8afd47b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_490066517db8a09176cacf92e3c31263 |
| publicationDate | 2005-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005010213-A |
| titleOfInvention | Chemically amplified positive photoresist composition and method for forming resist pattern |
| abstract | The present invention provides a photoresist composition capable of simultaneously achieving high heat resistance and high sensitivity required for production of a system LCD in which an integrated circuit and a liquid crystal display portion are formed on one substrate. (A) an alkali-soluble resin, (B) a compound represented by the following general formula (I), (C) a compound capable of generating an acid component upon irradiation with radiation, and an organic solvent, and A chemically amplified positive photoresist composition for system LCD, wherein the content of an acid component in the photoresist composition is 50 ppm or less. [Chemical 1] [Wherein, R 1 is an alkylene group having 1 to 10 carbon atoms which may have a substituent, or the following general formula (II): [Chemical 2] (Wherein, R 4 is an optionally substituted group showed an alkylene group having 1 to 10 carbon atoms, m represents 0 or 1.) Any one of the groups represented by ] [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102929102-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9567483-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9023590-B2 |
| priorityDate | 2003-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 190.