http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005008467-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01G35-00
filingDate 2003-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b10b5dbf5d8c886aa778d308028954c7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b997311c26c377e4e844e61894e9063
publicationDate 2005-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2005008467-A
titleOfInvention Method for making tantalum oxide thin film
abstract [PROBLEMS] To produce a tantalum oxide thin film of uniform quality with good reproducibility, to form a film with excellent adhesion to a substrate and few cracks, easy to produce and low in manufacturing cost. A method for producing a tantalum oxide thin film is provided. In a glove box, 0.6 ml of tantalum pentaethoxide is added to 30 ml of anhydrous toluene and mixed. The silicon substrate is immersed in this solution for 30 minutes. Thereafter, the silicon substrate is taken out, rinsed in anhydrous toluene, taken out from the glove box, and further subjected to ultrasonic cleaning in acetone for 10 minutes. [Selection figure] None
priorityDate 2003-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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