| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F01N2240-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0892
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B2203-041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0883
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0835
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0896
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0813
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2259-818 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-2475
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B3-342
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J12-007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J12-002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-922
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F01N3-0892 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F02M27-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B3-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J12-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F01N3-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-92 |
| filingDate |
2002-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2004-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2004533312-A |
| titleOfInvention |
Reactor for plasma-based treatment of gaseous media |
| abstract |
A silent exhaust or dielectric barrier type plasma reactor for processing of a gaseous medium includes a layer of material (34) positioned to provide a surface extending along at least a portion of the length of the gas flow path. . Granules or selected species are trapped on the surface. The preferred electrode configuration provides a plasma surface discharge at the surface of the material layer. [Selection diagram] Fig. 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4637531-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006063893-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015511170-A |
| priorityDate |
2001-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |