| abstract |
An optical diffusing element, hologram or other optical altering structure is produced by exposure to UV light, wherein the layer on the substrate is a system of a photosensitive resin, which comprises a silicone monomer, a prepolymer, a macromonomer or a comonomer; The silicone monomer or other monomer of the system includes ethylenic unsaturation and the system further includes a photoinitiator, which allows the system to perform free radical polymerization by exposure to UV light, for example, when light diffusing sheets or holograms are used. It is formed. When used to form light diffusing elements, this method consists of exposing the system through an optical aperture mask or simply exposing the entire surface directly to UV light without the intervention of an optical mask. |