http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004519002-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-11 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-11 |
| filingDate | 2001-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2004-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004519002-A |
| titleOfInvention | Polymerizable antireflective coatings deposited by plasma enhanced chemical vapor deposition |
| abstract | Provided is an improved method for providing a polymerizable antireflection film on a substrate surface and a precursor structure obtained thereby. Broadly, the method involves plasma enhanced chemical vapor deposition (PECVD) of a polymer on a substrate surface. Particularly preferred starting monomers are 4-fluorostyrene, 2,3,4,5,6-pentafluorostyrene, and allylpentafluorobenzene. The PECVD method applies enough current and pressure to the monomer that the applied current causes the monomer to evaporate, vaporize, and then change to a plasma state. The vaporized monomer subsequently polymerizes on the substrate surface in the deposition chamber. The method of the present invention is useful for obtaining a highly conformal antireflection film on a large surface substrate having a supersubmicron (0.25 μm or less) uneven pattern. The deposition rate according to the method of the present invention is much faster than the conventional chemical vapor deposition (CVD) method, and the method of the present invention is environmentally friendly and economical. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012063653-A |
| priorityDate | 2001-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 144.