| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-028 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3171 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G21K5-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J49-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-05
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G21K5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G21K1-093
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H5-02 |
| filingDate |
2001-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2004-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2004513495-A |
| titleOfInvention |
A mechanism for suppressing neutron radiation in the beamline of an ion implanter. |
| abstract |
A beam line for an ion implanter that suppresses or minimizes the generation of neutron radiation during operation of the ion implanter. A mass analysis magnet assembly is provided for use in an ion implanter. The mass analysis assembly comprises: (i) an interior region 49 through which the ion beam 15 passes, and a magnet 44 for mass analysis of the ion beam 15 output by the ion source 14; and (ii) outside the interior region 49. At least one impingement plate 48 partially defining a boundary. The at least one impingement plate is composed of a pure carbon-based material as a carbon isotope. The carbon isotope-pure carbon-based material preferably contains more than 99% carbon C-12 isotopes to suppress neutron radiation when deuterons extracted from the ion source 14 collide. The impingement plate 48 includes an upper layer 56 of carbon C-12 isotopes disposed on top of a lower layer 54. [Selection diagram] Fig. 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018206505-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7312259-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008192562-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102590845-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180131461-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021036526-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106793445-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6999007-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102481912-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2022517366-A |
| priorityDate |
2000-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |