http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004361473-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F232-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F216-14 |
filingDate | 2003-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_70dae81c3d98828434f6d96df79c7cbd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_011a1a34e0710f341a81c9dd1d273ea7 |
publicationDate | 2004-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2004361473-A |
titleOfInvention | Positive resist composition |
abstract | Disclosed is a positive resist composition suitable for use with an exposure light source of 200 nm or less, particularly F 2 excimer laser light (157 nm), and specifically exhibits sufficient transparency when using a light source of 157 nm. The present invention provides a positive resist composition having excellent developer compatibility and image forming properties. (A) A resin having a special repeating unit having a fluorine atom, which increases the solubility in an alkali developer by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation. A positive resist composition comprising: [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006134806-A1 |
priorityDate | 2003-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 225.