| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31637 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02183
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/E04B1-6125
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/E04C2-296
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-143 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-314 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B3-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8242
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-108
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01G35-00 |
| filingDate |
2003-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_050440a29423592d516e200f9e73e692
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d9409d211e92f84b04b742a137a9972
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_64871f2e0c4c0ed0ad97b1b3d1634f77
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7474d362bdb0ee366c12f7997b2a65d3 |
| publicationDate |
2004-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2004359532-A |
| titleOfInvention |
Composition for forming tantalum oxide film, tantalum oxide film and method for producing the same |
| abstract |
A composition for forming a tantalum oxide film capable of easily and efficiently forming a high-quality tantalum oxide film having a large relative dielectric constant and a small leak current and capable of being stored for a long period of time even in the atmosphere of high humidity conditions. Provided are a tantalum oxide film formed therefrom, and a method for producing the same. A composition for forming a tantalum oxide film comprises a tantalum alkoxide and at least one compound selected from a carboxylic acid and a carboxylic anhydride. And a solvent. The tantalum oxide film is formed by forming a coating film of the above composition and then subjecting the coating film to heat and / or light treatment. [Selection diagram] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012080066-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2014014109-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2014014110-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015124159-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014014108-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014014109-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102064728-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014014110-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020055099-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2014014108-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9714262-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011003620-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014141473-A |
| priorityDate |
2003-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |