| abstract |
A component for a semiconductor manufacturing apparatus capable of sufficiently responding to a demand for increasing the size of a semiconductor wafer and a demand for increasing a wafer transfer speed to increase a throughput, and a semiconductor manufacturing apparatus using these components. I do. Kind Code: A1 A part for a ventilation part that supplies or exhausts a reaction gas or exhaust gas, such as a shower head or a catalyst holding plate of an exhaust gas treatment apparatus, and a part for a vacuum suction part that holds a wafer, such as a vacuum chuck susceptor or a wafer fork. As a driving part component such as a wafer fork body or a lift pin, a porous aluminum nitride material having a porosity of 10 to 70% is used. [Selection diagram] None |