http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004341482-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_696ca0ae93d5cf5a686273601361781f |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2004-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4b796e240bd95e9009021cdd052a7ce http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c35d46618ed9f8e9ead456a9d0cd4699 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f853984c85e67773ba6e4556eadbb0f8 |
| publicationDate | 2004-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004341482-A |
| titleOfInvention | Resist composition |
| abstract | PROBLEM TO BE SOLVED: To be used not only for ultraviolet rays such as i-rays and g-rays, but also for radiations such as visible light, excimer laser light such as KrF, electron beam, X-ray, ion beam, etc., with high sensitivity, high resolution and high heat resistance. And a solvent-soluble resist composition. SOLUTION: The molecule has at least one acid dissociable functional group in the molecule, and the molecule has at least one functional group selected from urea group, urethane group, amide group and imide group in the molecule. , C) having a molecular weight of 500 to 5000, d) having a branched structure, e) satisfying the formula: 3 ≦ F ≦ 5 (where F is the total number of atoms / (the total number of carbon atoms−the total number of oxygen atoms)) F) having a nitrogen element content of 1 to 20% by mass, and at least one resist compound selected from the group consisting of visible light, ultraviolet light, excimer laser, electron beam, X-ray and ion beam. A resist composition comprising one or more acid or base generators that directly or indirectly generate an acid or base upon irradiation with any of the above radiations. [Selection diagram] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2005114331-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7919223-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8350096-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2662727-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2808736-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005309423-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2005101127-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8802353-B2 |
| priorityDate | 2003-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 426.