| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_242cc8d15c771395b920cc7de452da6a |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-27 |
| filingDate |
2003-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d68dd74c0090fab987a546dfe948ccf5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4fe5efe4c42606f7a2ce7a1be4be1a19
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f7473073dadbeac4aea2675cd36898ae
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6da1e102a0c3bcd1aa52dc199ff448b6 |
| publicationDate |
2004-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2004339561-A |
| titleOfInvention |
Method and apparatus for manufacturing film |
| abstract |
When manufacturing a film on a film forming surface of a base material by a plasma CVD method, control is performed such that a film thickness is locally increased. A film is formed on a film forming surface of a substrate by a plasma CVD method. By locally generating the magnetic field A on the film-forming surface 4a of the substrate 4, the ratio of the maximum value of the thickness of the film 6 to the minimum value is made twice or more. Preferably, the magnet 5 is locally installed on the back surface 4b side of the base material 4. [Selection diagram] Fig. 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5607760-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012090484-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013076790-A |
| priorityDate |
2003-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |