http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004325580-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c8d4dc7bd1a30d8fda907fceaeb4e69 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate | 2003-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5b7f702146e4af43f9bee790aeb65c5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c82456dedcd72cbb708c5cf623e11ed |
| publicationDate | 2004-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004325580-A |
| titleOfInvention | Photosensitive composition for near-infrared laser exposure, negative image forming material and image forming method using the same |
| abstract | A photosensitive composition for near-infrared laser exposure, which has high sensitivity to laser light in the infrared region and loses photosensitivity due to prolonged exposure to a white light, and the like. Provided are an image forming material and an image forming method used. A relative minimum exposure amount S 1 that is required to perform the exposure to the image formed by the near infrared laser, the outermost low exposure amount S 2 after the light irradiation 400 lux 120 minutes And a photosensitive composition for near-infrared laser exposure, wherein S 2 / S 1 ≧ 2. A photosensitive composition for near-infrared laser exposure, comprising (A) an epoxy acrylate resin, (B) an infrared absorbing dye having an absorption maximum at a wavelength of 650 to 1,300 nm, and (C) a halomethyl group-containing compound. A negative-type image forming material comprising a support and a photosensitive layer containing the photosensitive composition for near-infrared laser exposure formed thereon. An image forming method in which this image forming material is scanned and exposed by a near-infrared laser light source and then developed with an alkali developing solution. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113951913-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007079153-A |
| priorityDate | 2003-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 173.