| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fec576c38e34882531ca37d6b922bf42 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D307-93
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D307-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D307-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D305-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D307-93
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F16-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2003-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2944ca112e87a6b8753401f443e2b9c5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1bd5be9be9815b72cbd96780937bd39d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c4d7327e24e7044e6c935c32da2f141
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_355eedc29e86b6ec1a3a822680318142
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a549d2b56fbabdf2cc6d01a236e3b138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4656f165a48b05b56036ed177b29353e |
| publicationDate |
2004-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2004323422-A |
| titleOfInvention |
Fluorinated cyclic compound, fluorinated polymerizable monomer, fluorinated polymer compound, resist material and pattern forming method using the same |
| abstract |
The present invention provides a novel fluorine-based cyclic compound, a fluorine-based polymerizable monomer, and a fluorine-based polymer compound, and has high transparency in a wide wavelength range from an ultraviolet region to a near-infrared region. Another object of the present invention is to provide a resist material having both high adhesion to a substrate and high film forming property, and a pattern forming method using the same. A novel fluorinated cyclic compound having an oxacyclopentane or oxacyclobutane structure derived from norbornadienes and hexafluoroacetone has been found. By using a fluorine-based polymer compound polymerized or copolymerized using the fluorine-based cyclic compound or its derivative, an excellent resist material and a method for forming a fine pattern using the same have been found. [Selection diagram] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7919226-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7928262-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8030515-B2 |
| priorityDate |
2003-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |