http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004315250-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fec576c38e34882531ca37d6b922bf42 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-245 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C23-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-02 |
filingDate | 2003-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2507e10a2e40ead99fa09022938f4872 |
publicationDate | 2004-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2004315250-A |
titleOfInvention | Film forming method by sputtering method |
abstract | [PROBLEMS] In a film forming method by a sputtering method, as a means for pre-cleaning a substrate, a cleaning step in which degreasing cleaning with an organic solvent is combined with pure water cleaning requires a drying step, and an organic substance floating in the air adheres. Was difficult to prevent. In a film forming method by a magnetron sputtering method, the gas is selected from 30 to 100% by volume of oxygen gas and 0 to 70% by volume of nitrogen gas, helium gas, neon gas, argon gas, xenon gas, and krypton gas. A plasma gas of oxygen gas is generated from at least one gas, and the oxygen plasma is used to remove stains of organic substances adhered to the surface of the substrate. [Selection diagram] Fig. 1 |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010077483-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021193213-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4642891-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019131891-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010035649-A1 |
priorityDate | 2003-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.