http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004310067-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44ff3005508304394801e265e503b811 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C15-00 |
| filingDate | 2004-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e723b4110de0db2604150fcb545e8232 |
| publicationDate | 2004-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004310067-A |
| titleOfInvention | Mask blank glass substrate manufacturing method, mask blank manufacturing method, transfer mask manufacturing method, and semiconductor device manufacturing method |
| abstract | PROBLEM TO BE SOLVED: To prevent generation of surface defects and deterioration of surface roughness in a polishing process when polishing a glass substrate surface subjected to local processing. According to the concavo-convex shape measuring step for measuring the concavo-convex shape on the surface of the glass substrate and the measurement result obtained in the concavo-convex shape measuring step, the convexity of the convex portion existing on the glass substrate surface is specified, and this The local processing is performed after the flatness control step for controlling the flatness of the glass substrate surface to a predetermined reference value or less by applying the local processing to the convex portion under the processing conditions according to the convexity, and the flatness control step. In a method for manufacturing a glass substrate for mask blanks having a polishing step for polishing the surface of the glass substrate, an acid is applied to the surface of the glass substrate subjected to local processing after the flatness control step and before the polishing step. Alternatively, an alkali treatment is performed. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006176341-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012009833-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4647967-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011115157-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020043215-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9400421-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006240977-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7420189-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020043214-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8419963-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011207757-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4548319-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013170088-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7203542-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8518613-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006133629-A |
| priorityDate | 2003-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 55.