http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004302199-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A01K97-06 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2003-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d5ffbe3a002beae1e47db20f99af99f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a07fd7acd475118bc602e08b57373702 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_278135abcea06da9bc7ccfbae4bddad6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abf92c6162f276a54a5782dd87f205c1 |
| publicationDate | 2004-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004302199-A |
| titleOfInvention | Positive resist composition |
| abstract | An object of the present invention is to provide a positive-type photoresist composition that solves the problems in the above-mentioned performance improvement technology inherent in microphotofabrication using far ultraviolet light, particularly ArF excimer laser light, and has a PEB time dependency. Provided is a positive photoresist composition for small far ultraviolet exposure. A resin (A) in which all repeating units are acrylic units, has an alicyclic group, does not have an aromatic group, and has improved solubility in a developing solution by the action of an acid, and an acrylic unit as a repeating unit And a resin (B) containing a methacryl unit, having no aromatic group, improved in solubility in a developer by the action of an acid, and a compound (C) that generates an acid upon irradiation with actinic rays or radiation A positive resist composition. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7544460-B2 |
| priorityDate | 2003-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 230.