http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004302197-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2003-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_011a1a34e0710f341a81c9dd1d273ea7 |
| publicationDate | 2004-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004302197-A |
| titleOfInvention | Positive resist composition |
| abstract | An object of the present invention is to provide a positive resist composition suitable for use as an exposure light source of 160 nm or less, particularly F2 excimer laser light (157 nm), specifically exhibiting sufficient transparency when using a light source of 157 nm, A positive resist composition satisfying coating properties, development defects, and line edge roughness is provided. (A) A structure in which a specific group having a group decomposable by the action of an acid, a specific group having a group decomposable by the action of an acid, and a fluorine atom or a trifluoromethyl group in the main chain are substituted. A positive resist composition comprising a fluorine-containing resin and (B) a compound that generates an acid upon irradiation with actinic rays or radiation. [Selection figure] None |
| priorityDate | 2003-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 345.