| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36d1d9c59848bff6ad5f55923d1290f5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9671e9fcac93b9c0b0d9d6113e921c2a |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-792
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-788
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-092
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8247
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8234
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2003-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88d4f5511c15a30c38c84ba273223de9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18cbec3b23180114835736f96413bfe6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2a3e05a624fab53bafa52264b8abf61
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5dd9a593f1c24072020db9a01bd59d2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a3933b886d5a1a00e21b75c1c49190c |
| publicationDate |
2004-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2004296997-A |
| titleOfInvention |
Method for manufacturing semiconductor integrated circuit device |
| abstract |
An object of the present invention is to prevent an amine-based substance from flowing into ultrapure water in a process of producing ultrapure water used in a process of manufacturing a semiconductor integrated circuit device. SOLUTION: Secondary pure water produced by a first secondary pure water production system is produced by use points UP1 and UP2 supplied from an ultrapure water supply device UPW1, and a second secondary pure water production system. In a situation where the use points UP3 to UP5 in which the secondary pure water is supplied from the ultrapure water supply device UPW2 exist, the ultrapure water supply device UPW1 can supply the ultrapure water also to the use points UP3 to UP5. A pipe PIP1 is provided, and a pipe PIP2 that can supply ultrapure water from the ultrapure water supply device UPW2 to the use points UP1 and UP2 is provided, and the use of the ultrapure water supply device UPW1 and UPW2 is provided to use points UP1 to UP5. Make it possible to supply secondary pure water. [Selection diagram] FIG. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008258653-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8268735-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111769179-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111769179-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4602441-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5072025-B2 |
| priorityDate |
2003-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |