http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004294684-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73ebc284a55d5daf0e209d6186c9e65c |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J35-02 |
| filingDate | 2003-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d24ef3d8321318cb2d85df9f383861ff |
| publicationDate | 2004-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004294684-A |
| titleOfInvention | Exposure mask and patterning method |
| abstract | Provided is an exposure mask and a patterning method using the same, which can more efficiently use light by using a photocatalyst and thereby significantly reduce the time required for patterning. A patterning object having a characteristic changing layer having a characteristic changed by the action of a photocatalyst on a light-transmitting substrate is subjected to exposure processing using an exposure mask, so that the characteristic changing layer is formed. This is a patterning method for forming a pattern having a changed shape. As the exposure mask 10, a photocatalyst-containing layer 11 containing a photocatalyst and a light reflection layer 12 provided on one side of the photocatalyst-containing layer 11 are used. 11 is brought into contact with the characteristic change layer 16 of the patterning object 17, and in this state, light is selectively irradiated to the photocatalyst containing layer 11 from the light transmitting substrate 15 side of the patterning object 17 to expose. [Selection] Fig. 2 |
| priorityDate | 2003-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 204.