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filingDate 2003-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2004-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2004288609-A
titleOfInvention Electron emission source, manufacturing method thereof, and image display device
abstract PROBLEM TO BE SOLVED: To provide an electron emission source for FED having a minimum film thickness, a flat upper surface, a high-density opening, and an insulating layer having high heat resistance necessary for securing a withstand voltage, and to establish a manufacturing technology thereof. . SOLUTION: An electron emitting portion 3 containing CNT powder is formed on a cathode electrode 2 on a glass substrate 1 by printing, drying and firing. Next, an insulating layer 4 is formed by applying a liquid PPSQ on the cathode electrode 2, the electron-emitting portion 3, and the substrate 1, and polymerizing the PPSQ through a drying and baking process. Next, a gate electrode 5 is formed on the insulating layer 4 and the gate electrode 5 is etched using the resist film pattern 6P as a mask. Then, the insulating layer 4 is dry-etched to form an opening 8 having the upper surface 3EUS of the electron-emitting portion as the lower surface 8BS. [Selection diagram] FIG.
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