http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004286845-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-30 |
filingDate | 2003-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_201abdae12f920f7b848ecd29a09137f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1826cb53e8e5226054260a30aabfebb1 |
publicationDate | 2004-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2004286845-A |
titleOfInvention | Chemically amplified resin composition |
abstract | An object of the present invention is to provide a chemically amplified resin composition suitable for use as an exposure light source of 160 nm or less, particularly F 2 excimer laser light (157 nm), specifically using a light source of 157 nm. Provided is a chemically amplified resin composition that sometimes has both excellent sensitivity and line edge roughness characteristics. A chemically amplified resin composition comprising a resin having a group capable of decomposing upon irradiation with actinic rays or radiation to generate an acid and containing a fluorine atom. [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015141356-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006336005-A |
priorityDate | 2003-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 252.