| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2438-01 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-165
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F292-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F292-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41N1-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41C1-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-16 |
| filingDate |
2003-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b007f5906bc3a65385b3ce1eccb1352
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_430cecec3a87d6d06ecfe61026e7a132 |
| publicationDate |
2004-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2004285325-A |
| titleOfInvention |
Pattern forming method and material adhesion pattern material |
| abstract |
PROBLEM TO BE SOLVED: To provide a pattern forming method having a wide application range in which a uniform and highly sharp substance adsorption pattern can be easily obtained by applying energy regardless of the area of the pattern forming material. SOLUTION: A step of forming a region having a polymerization initiating ability on a substrate surface in an image-like manner, and generating a graft polymer in the region using atom transfer radical polymerization, thereby comprising a graft polymer generation region and a non-generation region. The method includes a step of forming a parent / hydrophobic pattern and a step of attaching a substance to a hydrophilic region or a hydrophobic region of the parent / hydrophobic pattern. The formation of the region having the polymerization initiating ability is preferably carried out by fixing the initiator over the entire surface of the substrate and performing imagewise exposure thereto to deactivate the polymerization initiating ability of the initiator in the exposed region. The substance to be attached can be selected and applied to an image forming material, a fine particle pattern forming material, and a conductive pattern material. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006104279-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007017910-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006282878-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8149410-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008038441-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I624517-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008083519-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020045428-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009283907-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4712420-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009292911-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006140376-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009292912-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012072394-A |
| priorityDate |
2002-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |