http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004279576-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2003-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9374f4123bd8b1b64d636e0d35cca04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_601ba4a71019c4ad5d4dff3748ba6624 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82d2e7bd7d775c3e6365dd10d40840a1 |
| publicationDate | 2004-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004279576-A |
| titleOfInvention | Positive resist composition |
| abstract | The present invention can be suitably used when an ArF excimer laser beam is used as an exposure light source, reduces the initial value of the number of particles immediately after the preparation of the resist solution, and reduces the increase in the number of particles during storage of the resist solution. A positive resist composition having a high profile, high sensitivity, and high resolution is provided. (A) A resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and having increased solubility in an alkali developer by the action of an acid, and (B) irradiation with actinic rays or radiation of a specific structure A positive resist composition comprising a compound capable of generating an acid by. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007041146-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018018065-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022190922-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022065025-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4590325-B2 |
| priorityDate | 2003-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 308.