abstract |
Kind Code: A1 A composition for forming a silica-based film, which has excellent low-dielectric properties, has excellent low-dielectric stability over time, and is capable of obtaining a silica-based film having sufficient mechanical strength. Provided is a method for producing a system-based coating, and an electronic component having the silica-based coating. A composition for forming a silica-based film, comprising: (a) a siloxane resin such as alkoxysilane as a component; and (b) at least one inorganic acid and at least one organic acid. [Selection diagram] None |