| abstract |
[PROBLEMS] To form a fluorine-containing resin having excellent ink repellency, ink tumbling property, and developability, and to form a coating film excellent in ink repellency and ink tumbling property, and to form a fine pattern. A photosensitive resin composition is provided. An alkyl group (a) having 20 or less carbon atoms in which at least two hydrogen atoms are substituted with fluorine atoms, a group (b) having a polysiloxane structure, and an acidic group (c), and an acid group. A fluorine-containing resin (A) having a value of 5 to 300 mgKOH / g. A photosensitive resin composition comprising the fluororesin (A), a photoacid generator (B), and an acid crosslinking agent (C). A photosensitive resin composition containing the fluororesin (A), a radical photopolymerization initiator (E), and a radical crosslinking agent (F). [Selection figure] None |