| abstract |
[PROBLEMS] To form a fluorine-containing resin exhibiting excellent ink falling property, ink repellency and developability, and a coating film excellent in ink falling property and ink repellency, and further capable of forming a fine pattern. A photosensitive resin composition is provided. A silicon-containing resin (A) having a group (a) having a polysiloxane structure and a blocked acidic group (b). A photosensitive resin composition comprising the silicon-containing resin (A), a synthetic resin (B) having a blocked acidic group (b), and a photoacid generator (C). [Selection figure] None |