http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004270005-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate | 2003-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_539986221c58557bbbc61a034f122a18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96abda079f1370d4cf7553097dd117d6 |
| publicationDate | 2004-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004270005-A |
| titleOfInvention | Thin film forming equipment |
| abstract | An object of the present invention is to provide a thin film forming apparatus having a gas mixing chamber in which gases are mixed well and thereby there are few structural restrictions. A gas mixing chamber (25) and first and second gas supply nozzles (26) and (27) opening into the gas mixing chamber are provided, and the first and second gas supply nozzles open so as to face each other. The first gas supply nozzle is arranged and the cross-sectional area of the opening of the first gas supply nozzle is larger than the cross-sectional area of the opening of the second gas supply nozzle. [Selection] Fig. 2 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-4159889-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016515925-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010258046-A |
| priorityDate | 2003-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.