http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004233429-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2003-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_201abdae12f920f7b848ecd29a09137f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_011a1a34e0710f341a81c9dd1d273ea7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1826cb53e8e5226054260a30aabfebb1 |
| publicationDate | 2004-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004233429-A |
| titleOfInvention | Positive resist composition |
| abstract | Provided is a positive resist composition exhibiting sufficient transparency when using a light source of 160 nm or less, specifically F 2 excimer laser light (157 nm), and having high sensitivity and high resolution. (A) An alkali-soluble resin having a fluorine atom, (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and (C) a fluorine atom and a group capable of decomposing by the action of an acid, and increasing the solubility in an alkaline aqueous solution by the action of an acid. A positive resist composition comprising a low molecular acid decomposable compound. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7700257-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004354954-A |
| priorityDate | 2003-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 457.