| abstract |
An object of the present invention is to provide a high-frequency plasma processing apparatus and a high-frequency plasma processing method capable of maintaining stable plasma with low power. Kind Code: A1 A diameter of a gas outlet 21a into a discharge tube 11 or a direction thereof is specified, or a rectifying portion is formed by a gap 22 between the gas outlet 21a and a head 27, and the gap 22 is formed. By specifying the size of the plasma, the plasma in the discharge tube 11 can be stabilized with low power. [Selection diagram] Fig. 1 |